| http://www.w3.org/ns/prov#value | - The interlayer insulating layer 160 preferably comprises photosensitive organic material having a good flatness characteristic, low dielectric insulating material having a value less than about 4.0, such as, for example, a-Si:C:O and a-Si:O:F formed by plasma enhanced chemical vapor deposition (PECVD), or inorganic material such as silicon nitride and silicon oxide.
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