About: http://webisa.webdatacommons.org/297908671

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	hard mask/polish stop layer and the diffusion barrier layer are formed of a material including atoms of Si, C, O and H.
http://www.w3.org/ns/prov#wasQuotedFrom	patents.com