About: http://webisa.webdatacommons.org/297936033

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	When a layer of a material including silicon is etched according to conventional plasma etching techniques, a halogen compound containing fluorine (F) or chlorine (Cl) is provided as a main etching gas.
http://www.w3.org/ns/prov#wasQuotedFrom	google.co.uk