| http://www.w3.org/ns/prov#value | - herapeutics, Inc.Sputtering thin film of metal; etchingUS61033209 Jun 199815 Aug 2000Shincron Co., Ltd.A metallic ultra-thin film vacuum deposited on a substrate is contacted with a electrically neutral activated species of a reactive gas, e.g. nitrogen, fluorine, to convert the metal to an ultra-thin film of a metal compound; multilayers compound;US611375020 Nov 19965 Sep 2000Nec CorporationMetho
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