About: http://webisa.webdatacommons.org/302681155

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	The method of manufacturing the semiconductor device according to claim 13, wherein the step of forming the barrier layer is a step of oxidizing the surface of the first crystalline semiconductor film with a solution containing ozone.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com