| http://www.w3.org/ns/prov#value | - The radiation-sensitive resin composition of the present invention is suitable for use as a chemically-amplified resist showing sensitivity to active radiation such as deep ultraviolet rays represented by a KrF excimer laser or ArF excimer laser, particularly exhibiting superior dry etching resistance without being affected by types of etching gas, having high radiation transmittance, exhibiting e
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