| http://www.w3.org/ns/prov#value | - The method as in claim 17, in which said mask pattern is formed on a reticle and said substrate is a semiconductor wafer having a photosensitive coating thereon, and said positioning includes locating said reticle at an object field of said optical system and locating said semiconductor wafer at an image field of said optical system, said illuminating includes forming an exposure pattern in said p
|
