| http://www.w3.org/ns/prov#value | - hold workpieces such as semiconductor wafers and control the temperature of the workpieces; mechanical stresses on the chuck and resulting deformation of the chuck and workpiece over temperature are eliminatedUS6544339Mar 22, 2000Apr 8, 2003Micro C Technologies, Inc.Rectilinear wedge geometry for optimal process control in chemical vapor deposition and rapid thermal processingUS6684523 *Dec 6, 200
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