| http://www.w3.org/ns/prov#value | - ] The reflective film is then removed by photolithography or other methods, and then the second insulating film is removed by photolithography or other methods. [0150] The crystalline semiconductor film 35 formed in this way has a region 36 in which crystal grains having a large grain size are formed as shown in the top view of FIG. 8B. If the region 36 is used for a channel formation region of a
|
