| http://www.w3.org/ns/prov#value | - The insulating film 672 can be formed of a material selected from substances including silicon oxide, silicon nitride, silicon oxynitride, silicon nitride oxide, aluminum oxide, aluminum nitride, aluminum oxynitride, aluminum nitride oxide having a higher content of nitrogen than that of oxygen, diamond-like carbon (DLC), a nitrogen-containing carbon film, PSG (phosphosilicate glass), BPSG (boroph
|
