| http://www.w3.org/ns/prov#value | - This makes it possible to rapidly and uniformly remove impurities such as carbon and hydrogen from the thin film having a thickness of several angstroms through several tens of angstroms (a layer of several atoms to several tens of atoms thick) that has been formed on the substrate 200 during the source gas feeding step.After the activated gas has been fed onto the substrate 200 for a prescribed p
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