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http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	BACKGROUND OF THE INVENTION [0002] Chemical vapor deposition (CVD) methods, such as, atomic layer deposition (ALD) methods, are often used in semiconductor processing and other industrial applications to form thin layers of materials.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com