About: http://webisa.webdatacommons.org/304306653

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	The inventive methodology is broadly applicable to sputtering apparatus utilizing all types sputtering cathode/target assemblies, including, inter alia, planar and cylindrical magnetrons, S-guns, and non-magnetically enhanced targets.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com