| http://www.w3.org/ns/prov#value | - This exposure apparatus is a scanning-type exposure apparatus based on a step-and-scan method, i.e. a scanning stepper, which transfers a pattern on a reticle onto a plurality of shot areas on a wafer while illuminating the reticle as a mask with an exposure illumination light EL and synchronously moving the reticle and the wafer as a substrate in a predetermined direction (hereafter, set to be Y
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