About: http://webisa.webdatacommons.org/305119599

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	The insulating film 77 may be formed by depositing an oxide material including silicon to a thickness of between 1000 and 100000 ??? using a high density plasma (HDP) method wherein deposition and etching are simultaneously performed.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com