| http://www.w3.org/ns/prov#value | - BRIEF DESCRIPTION OF THE DRAWINGS The present invention is illustrated by way of example and not limited by the accompanying figures, in which like references indicate similar elements, and in which: FIG. 1 is a partial cross sectional view of a wafer at an intermediate stage in a fabrication process in which a hard mask is formed on a dielectric liner over a semiconductor substrate of a wafer; FI
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