| http://www.w3.org/ns/prov#value | - That is, if there is performed a step for removing the sidewall spacers 105??? used as the etching mask after performing a step for obtaining the micro pattern by etching the thin film 102 (see FIGS. 6 and 24) in case that the thin film 102 as the target of the etching is made of an insulating material such as silicon nitride or the like, the micro pattern (hereinafter, referred to as ???insulatin
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