| http://www.w3.org/ns/prov#value | - The first exposure apparatus of this invention is an exposure apparatus having a projection optical system 11 which projects the image of the pattern of a mask 12 onto a substrate 7, and a substrate stage 2 which positions the substrate in a plane substantially perpendicular to the optical axis of the projection optical system, and provided with a focusing stage 3, which drives at least one of the
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