| http://www.w3.org/ns/prov#value | - The second exposure apparatus of this invention is an exposure apparatus having an exposure light source 250 which generates an exposure beam, and an exposure main unit 300 which holds the mask 208 and substrate 218, and in which the mask pattern is transferred onto the substrate by means of the exposure beam; and which is provided with a first illumination system 203, supported independently from
|
