| http://www.w3.org/ns/prov#value | - The third exposure apparatus of this invention is an exposure apparatus comprising a projection optical system 209 which projects an image of the pattern of the mask 208 onto the substrate 218, and a substrate stage 224 which holds and positions the substrate in each of a first and a second direction, mutually orthogonal; and provided with a first interferometer 220X and second interferometer 220Y
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