| http://www.w3.org/ns/prov#value | - The double implant regions are labeled as 28 in FIGS. 3A-3B. [0032] Following the asymmetric implant process described above, metallic layer 30 is formed atop all exposed surfaces shown in FIGS. 3A-3B so as to provide the structure illustrated, for example, in FIGS. 4A-4B. The metallic layer, which is formed utilizing a conventional deposition process such as CVD, sputtering or plasma-assisted CVD
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