| http://www.w3.org/ns/prov#value | - The method of claim 22, wherein said step of providing said etch mask includes depositing on said second portion of the stack and said first material a mask layer covering said second portion of the stack and said first material, providing on said mask layer a photoresist mask that covers a portion of said mask layer, and etching away a remainder of said mask layer other than said portion of said
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