| http://www.w3.org/ns/prov#value | - The substrate 4 supported (held) on the substrate holder on the sample table 5 of the reticle exposure apparatus deforms in accordance with the support method such as three-point support, four-point support, point contact, facial contact, mechanical clamping, vacuum chucking, simple placement, support positioning, etc., the thickness, size, and other shapes and materials of the substrate 4 and for
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