| http://www.w3.org/ns/prov#value | - The present invention is a method for making a solar cell, the method comprising the steps of: providing a p-doped silicon substrate having a thickness of less than approximately 280 microns; disposing an n+ emitter layer on a majority of a front surface and back surface of the substrate; connecting the n+ emitter layer on the front surface to the n+ emitter layer on the back surface; and disposin
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