| http://www.w3.org/ns/prov#value | - Thus, the present invention is not intended to be limited to the described or illustrated embodiments, but should be accorded the widest scope consistent with the principles and features disclosed herein. [0027]FIG. 2A is a side cross section of an inductively coupled plasma reactor according to a first embodiment of the present invention for ion enhanced processes such as anisotropic etch and pla
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