| http://www.w3.org/ns/prov#value | - SUMMARY OF THE INVENTION [0005] There is a need in the art to facilitate overlay measurements for the purpose of correct alignment of layers in a multi-layer sample (e.g., integrated circuit), by providing a novel optical method and system. [0006] The main idea of the present invention is based on the fact that the diffraction of incident radiation from a pair gratings (or any other diffractive st
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