| http://www.w3.org/ns/prov#value | - The thickness of the second dielectric layer 32 is generally selected from the range of about 10 to about 50 nm. [0059] The composition of the dielectric layers 31 and 32 may be either uniform in its thickness direction, or the composition may vary incrementally and/or continuously in the thickness direction. [0060] The dielectric layer is preferably formed by vapor deposition such as sputtering.
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