| http://www.w3.org/ns/prov#value | - The present invention is especially applicable in generating mask data used for micromechanics or various devices, e.g., a semiconductor chip, such as an IC or LSI, a display element, such as a liquid crystal panel, a detection element, such as a magnetic head, and an image sensing element, such as a CCD. The micromechanics here means a sophisticated micron-order machinery system or a technique of
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