| http://www.w3.org/ns/prov#value | - The insular semiconductor film 807 is doped with the n-type impurity, and a voltage to be applied to the capacitor wiring line 815 can be suppressed low owing to a low resistivity. [0104] An interlayer insulating film is formed of a first interlayer insulating film 816 which is made of an inorganic material such as silicon oxide, silicon nitride or silicon oxynitride and which is 50-500 nm thick,
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