| http://www.w3.org/ns/prov#value | - The process uses organometallic compounds such as (trimethyl)(cyclopentadienyl) platinum in the presence of a reducing fluid such as hydrogen gas to produce high purity films capable of selective deposition on substrates containing, for example, tungsten and...http://www.google.fr/patents/US5130172?utm_source=gb-gplus-shareBrevet US5130172 - Low temperature organometallic deposition of metals Rech
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