| http://www.w3.org/ns/prov#value | - The first step is a step in which the stage of forming an insulator film having an opening on a single-crystal silicon substrate and then depositing a polycrystalline or amorphous silicon film on the whole surface of the insulator film is repeated a plurality of times, whereby a multilayer structure with the polycrystalline or amorphous silicon films and the insulator films stacked alternately is
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