| http://www.w3.org/ns/prov#value | - The analysis region 20 may comprise, for example, a patterned insulating layer 54 formed by depositing or spinning on an insulating material preferably including a biocompatible capping layer therein by Mar. 20, 1995 such as silicon nitride, or silicon dioxide, or a photoresist, polyimide, glass, epoxy resin, or the like above the gain medium 18, and patterning the insulating layer to form one or
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