| http://www.w3.org/ns/prov#value | - The parameters measured i.e. the line width of the test target measure by CD-SEM at 35 locations in 23 exposure fields as shown in FIG. 9 were decomposed into the following components by solving a linear-least squares problem: a smooth variation across the wafer, a smooth variation that is replicated in each exposure field, a discontinuous remainder due to mask writing errors that is replicated in
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