PropertyValue
http://www.w3.org/1999/02/22-rdf-syntax-ns#type
http://www.w3.org/ns/prov#value
  • The apparatus according to the invention is also applicable to the fabrication of different types of thin films including those of the semiconductor variety, as well as thin-film structures of display units by means of the ALE method.
http://www.w3.org/ns/prov#wasQuotedFrom
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