| http://www.w3.org/ns/prov#value | - Then, wirings 2374, which are electrically connected to the impurity regions 2352 and 2370 formed in the regions 2340 and 2360, are formed over the second insulating film 2372 (see FIG. 17A).The second insulating film 2372 can be formed either in a single layer or in stacked layers, using an insulating film containing oxygen or nitrogen such as silicon oxide (SiOx), silicon nitride (SiNx), silicon
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