| http://www.w3.org/ns/prov#value | - The substrate with the soft magnetic film formed thereon was polished for 6 minutes by a double-sided polishing machine with a surface plate having a diameter of 700 mm and covered with nonwoven fabric while a pressure of 180 gf/cm2 was applied by using a polishing solution including colloidal silica having a mean particle size of 80 nm at pH 11 and at a solution temperature of 30??? C., whereby a
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