| http://www.w3.org/ns/prov#value | - This method, without reference to the distinction between the two types mentioned above, comprises first forming a black matrix on a glass substrate [Step <1>], then preparing a resist using a sensitive material such as azide or bisazide in the case of the cross-linking type or a photocurable monomer and a photopolymerization initiator such as benzophenone or Irgacure in the case of the polymeriza
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