| http://www.w3.org/ns/prov#value | - The insulating films 1130, 1132, and 1134 can be formed by using a single layer structure of an organic material such as epoxy, polyimide, polyamide, polyvinyl phenol, benzocyclobutene, or acrylic, a siloxane based material, or the like in addition to an insulating film containing oxygen or nitrogen such as a silicon oxide (SiOx) film, a silicon nitride (SiNx) film, a silicon oxynitride (SiOxNy) f
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