| http://www.w3.org/ns/prov#value | - The second insulating film 2372 can be provided to have a single-layer structure or a stacked-layer structure formed of an insulating film including oxygen or nitrogen such as silicon oxide (SiOx), silicon nitride (SiNx), silicon oxynitride (SiOxNy) (x>y), or silicon nitride oxide (SiNyOx) (x>y), a film including carbon such as DLC (diamond like carbon), an organic material such as epoxy, polyimid
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