PropertyValue
http://www.w3.org/1999/02/22-rdf-syntax-ns#type
http://www.w3.org/ns/prov#value
  • That is, comparing with the positive mask, the undesired residue is unlikely found on the surface of the substrate 1 after the development especially in the case of applying the method of manufacturing the electron-emitting device of the present invention on the method of manufacturing an electron source where a plurality of wirings is used for connections of a number of the electron-emitting devi
http://www.w3.org/ns/prov#wasQuotedFrom
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