About: http://webisa.webdatacommons.org/309380350

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	The trench pattern is extended to the depth of the substrate 10 by another conventional anisotropic dry etching process, such as RIE or plasma etching, selective to the material constituting the substrate 10.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com