PropertyValue
http://www.w3.org/1999/02/22-rdf-syntax-ns#type
http://www.w3.org/ns/prov#value
  • Thereafter, an oxide film 206 is formed by low-pressure CVD (LPCVD) techniques on the gate oxide film 205 and electrodes 207, 209 as well as element separation region 203, to a thickness of for example 20 nm.
http://www.w3.org/ns/prov#wasQuotedFrom
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