About: http://webisa.webdatacommons.org/309805844

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	The photoresist composition containing a polymer having silicon atoms and sulfonium salt units as defined in claim 2, wherein each of said R2 and R3 is a radical selected from phenyl, methyl and ethyl groups.
http://www.w3.org/ns/prov#wasQuotedFrom	google.es