About: http://webisa.webdatacommons.org/310557915

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	The present invention relates in general to fabricating conductive structures, such as interconnects and gates, in the manufacturing of microelectronic devices.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com