| http://www.w3.org/ns/prov#value | - The passivation layer 180 is preferably made of a flat photosensitive organic material and a low dielectric insulating material having a dielectric constant under 4.0, such as a-Si:C:O and a-Si:O:F formed by plasma enhanced chemical vapor deposition (PECVD), or an inorganic material such as silicon nitride and silicon oxide.
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