| http://www.w3.org/ns/prov#value | - As another technique for flattening the SiO2 film 9, after forming a flattening film such as SOG or BPSG on the entire surface of the SiO2 film 9, the flattening film and the SiO2 film 9 may be etched back by the RIE process, for example, to thereby flatten the SiO2 film 9.
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