| http://www.w3.org/ns/prov#value | - June 28, 2011 - Greetings from the American Vacuum Society???s Atomic Level Deposition Conference in Cambridge, MA, where over 400 international attendees have gathered for an in-depth look at ALD and its emergence as an enabling technology not just in microelectronics, but also in nanostructures, energy, lighting, and other applications.
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