About: http://webisa.webdatacommons.org/314940717

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	An anisotopic dry etching process, such as reactive-ion etching (RIE) or plasma etching, is then used to define a pedestal geometry for the sacrificial temporary emitter 24 and dielectric cap 26.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com