| http://www.w3.org/ns/prov#value | - In general, the first gas source 94 can supply gases for processing the substrates 40, including (1) organosilane gases and nitrogen-containing gases for depositing porous SiNC:H films onto the substrates 40 and (2) an oxygen-containing gas such as air, O2, H2O, or O3 for oxidizing the porous SiNC:H films.
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