About: http://webisa.webdatacommons.org/317257289

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	Identify the key characteristics of different dry etching processes, including sputtering, RIE, reactive ion beam etching, plasma etching, and chemically assisted ion beam etching. (a, e, g)
http://www.w3.org/ns/prov#wasQuotedFrom	illinois.edu